Lead R&D, operation, and sustainment of advanced CDSEM metrology with a focus on AFM, overlay/registration, X‑ray metrology, and optical techniques. Develop, qualify, and standardize CD metrology methods to achieve best‑in‑class accuracy, precision, and repeatability for advanced nodes. Drive inline detection strategies in close collaboration with process and integration teams to enable rapid learning cycles.

• Perform detailed CD, profile, and roughness analysis to diagnose process issues and ensure robust pattern fidelity.
• Partner with design, process, and integration teams to define metrology requirements and monitoring schemes that support advanced patterning and scaling.
• Generate high‑impact metrology reports with clear data interpretation, root‑cause analysis, and actionable recommendations.
• Establish and advance state‑of‑the‑art CD metrology capabilities, including tool benchmarking, method innovation, and workflow ...